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What is commonly used to clean flux residue preferably?

Publish Time: 2024-08-30

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What is commonly used to clean flux residue preferably?


The method of cleaning flux residues and the choice of cleaning agent depends on the type of flux, and different fluxes require different cleaning methods.

What is commonly used to clean flux residue preferably?cid=64

Flux residue is a common problem in the electronic manufacturing process, the choice of cleaning method depends on the nature of the residue, cleaning requirements and the characteristics of the equipment. The following are several commonly used flux residue cleaning methods:

1. Water rinse: use pure water or deionised water for cleaning. This method is simple and easy to use, but may not be able to completely remove all the residues, especially for oily or sticky flux, only for water-soluble flux.

2. Solvent cleaning: the use of anhydrous alcohol, ethanol, special cleaning agents and other organic solvents for cleaning. This method can dissolve the flux, making it easier to remove. However, organic solvents are flammable and explosive, the use of which requires attention to safety.

3. Ultrasonic cleaning: the use of ultrasonic vibration to accelerate the cleaning process. Ultrasonic cleaning can remove stubborn flux residues, but you need to choose the right cleaning fluid and cleaning parameters to avoid damage to components.

4. Airflow cleaning: the use of high-pressure gas blowing flux residues. This method is suitable for cleaning larger components or circuit boards, but may not be able to completely remove all the residue.

5. Spray cleaning: the use of high-pressure water or gas spray to remove residues. Spray cleaning can cover a large area, but also need to pay attention to the selection of the appropriate cleaning fluid and cleaning parameters.

6. Dry ice cleaning: the use of dry ice particles as a cleaning medium, through high-speed jetting will be flux residues frozen and stripped. This method is environmentally friendly and efficient, but the cost of equipment is higher.

When choosing a cleaning method, the following factors need to be considered:

1. Cleaning requirements: according to the product requirements to select the appropriate cleaning method to ensure that the cleaning quality meets the standards.

2. Equipment characteristics: different equipment may require different cleaning methods, for example, for components with high temperature sensitivity, you need to choose a mild cleaning method.

3. Selection of cleaning fluid: According to the type and nature of flux to choose the appropriate cleaning fluid to ensure the best cleaning effect.

4. Setting of cleaning parameters: According to the cleaning fluid and equipment requirements to set the appropriate cleaning parameters, such as temperature, time, pressure, frequency and so on.

5. Cleaning safety: in the cleaning process need to comply with safety regulations to avoid causing accidents.

Select the appropriate cleaning methods and cleaning agents, flux residue cleaning methods need to take into account a variety of factors to ensure that the quality of cleaning in line with product requirements, not only can effectively remove flux residue, but also protect the performance and life of the circuit boards and electronic components, while safeguarding the safety of operators.

Next, I recommend Fitech flux, Fitech flux products in the field of electronic manufacturing has been widely used, a wide range of products, including rosin-based, water-soluble, no-clean flux, etc., with the following characteristics: strong activity, easy to clean, adhesion, high reliability, wide adaptability, if you have a more detailed understanding of the Fitech flux or other related products need, welcome to come to the communication at any time! Negotiation!

 

 


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